<?xml version="1.0" encoding="UTF-8"?><rss version="2.0" xmlns:taxo="http://purl.org/rss/1.0/modules/taxonomy/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dc="http://purl.org/dc/elements/1.1/"><channel><title>Journal of Vacuum Science </title><link>http://scitation.aip.org/</link><description>You searched   in Full Bibliographic Record </description><language>en-US</language><item><title>Electrical properties of C60 and Si codoped GaAs layers</title><link>http://link.aip.org/link/doi/10.1116/1.3678205?agg=rss</link><description>&lt;span class='authors'&gt;Jiro Nishinaga and Yoshiji Horikoshi&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 C60 uniformly doped GaAs and C60, Si codoped GaAs layers are grown by a migration enhanced epitaxy method. C60 doped GaAs layers show a single and sharp diffraction peak in x-ray diffraction and only an LO phonon peak is confirmed, indicating that the crystalline quality is fairly good. All of the ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B116 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Jan 24, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 24 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3678205?agg=rss</guid></item><item><title>Magnetic anisotropy of GaAs/Fe/Au core-shell nanowires grown by MBE</title><link>http://link.aip.org/link/doi/10.1116/1.3678203?agg=rss</link><description>&lt;span class='authors'&gt;K. Tivakornsasithorn, R. E. Pimpinella, and V. Nguyen et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 GaAs/Fe/Au core-shell nanowires were grown on GaAs(111)B substrates by molecular beam epitaxy. Scanning electron microscopy images show that the Fe shell has successfully coated the sidewalls of GaAs nanowires. Magnetic anisotropy of GaAs/Fe core-shell nanowires was studied by ferromagnetic resona ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B115 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Jan 24, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 24 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3678203?agg=rss</guid></item><item><title>Low resistance and thermally stable Ti/Al-based Ohmic contacts to N-face n-GaN for vertical light-emitting diodes by using Ti(Ga) solid solution and TiN layers</title><link>http://link.aip.org/link/doi/10.1116/1.3678490?agg=rss</link><description>&lt;span class='authors'&gt;Joon-Woo Jeon, Woong-Sun Yum, and Tae-Yeon Seong et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The authors report on the formation of highly reliable Ti/Al-based ohmic contacts to N-face n-GaN for high-performance vertical light-emitting diodes by using Ti(Ga) solid solution and TiN layers. The Ti(Ga) solid solution layer is used to minimize the outdiffusion of Ga atoms from the n-GaN surfa ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 020601 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Jan 24, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 24 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3678490?agg=rss</guid></item><item><title>Multi-phase model for reflection anisotropy spectra of copper phthalocyanine films on anisotropic silicon substrates</title><link>http://link.aip.org/link/doi/10.1116/1.3677823?agg=rss</link><description>&lt;span class='authors'&gt;Falko Seidel, Li Ding, and Ovidiu D. Gordan et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Reflection anisotropy spectroscopy (RAS) and spectroscopic ellipsometry (SE) have extensively been applied to inorganic and organic structures and, because of the similarity of these two techniques, the evaluation procedure of RA spectra can be performed in a similar way as for SE. Especially for  ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 012401 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Mon Jan 23, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Mon, 23 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3677823?agg=rss</guid></item><item><title>Crystallization of Ge in SiO2 matrix by femtosecond laser processing</title><link>http://link.aip.org/link/doi/10.1116/1.3677829?agg=rss</link><description>&lt;span class='authors'&gt;Omer Salihoglu, Ulaş Kürüm, and Halime Gul Yaglioglu et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Germanium nanocrystals embedded in a siliconoxide matrix has been fabricated by single femtosecond laser pulse irradiation of germanium doped SiO2 thin films deposited with plasma enhanced chemical vapor deposition. SEM and AFM are used to analyze surface modification induced by laser irradiation. ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011807 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Jan 19, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 19 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3677829?agg=rss</guid></item><item><title>Growth of GaSb1−xBix by molecular beam epitaxy</title><link>http://link.aip.org/link/doi/10.1116/1.3672025?agg=rss</link><description>&lt;span class='authors'&gt;Yuxin Song, Shumin Wang, and Ivy Saha Roy et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Molecular beam epitaxy for GaSb1−xBix is investigated in this article. The growth window for incorporation of Bi in GaSb was found. Strategies of avoiding formation of Bi droplets and enhancing Bi incorporation were studied. The Bi incorporation was confirmed by SIMS and RBS measurements. The Bi c ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B114 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Wed Jan 18, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Wed, 18 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672025?agg=rss</guid></item><item><title>Integration of a thin film III–V edge emitting laser and a polymer microring resonator on an SiO2/Si substrate</title><link>http://link.aip.org/link/doi/10.1116/1.3676031?agg=rss</link><description>&lt;span class='authors'&gt;Sabarni Palit, Matthew Royal, and Nan Jokerst et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The planar integration of on-chip laser sources with optical sensing elements, waveguide optical interconnect, and detectors enables the implementation of portable, efficient chip-scale systems, with applications in areas that include medical, environmental, biological, and chemical sensing system ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011209 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Jan 12, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 12 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3676031?agg=rss</guid></item><item><title>Homoepitaxial N-polar GaN layers and HEMT structures grown by rf-plasma assisted molecular beam epitaxy</title><link>http://link.aip.org/link/doi/10.1116/1.3676175?agg=rss</link><description>&lt;span class='authors'&gt;D. F. Storm, D. J. Meyer, and D. S. Katzer et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The authors have investigated the growth and structural and electrical properties of homoepitaxial GaN layers and GaN/AlGaN heterostructures grown on free-standing, hydride vapor phase epitaxy grown, N-polar GaN:Fe substrates by rf-plasma molecular beam epitaxy. Secondary-ion mass spectroscopic an ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B113 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Jan 12, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 12 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3676175?agg=rss</guid></item><item><title>Effects of proton irradiation energies on degradation of AlGaN/GaN high electron mobility transistors</title><link>http://link.aip.org/link/doi/10.1116/1.3676034?agg=rss</link><description>&lt;span class='authors'&gt;Hong-Yeol Kim, Jihyun Kim, and Lu Liu et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The authors report the proton energy dependence of the degradation of AlGaN/GaN high electron mobility transistors (HEMTs) with GaN cap layers from 5 to 15 MeV at a fixed dose of 5 × 1015 cm−2. All the samples degraded after proton irradiation. However, higher damage in dc electrical properties wa ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 012202 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Jan 12, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 12 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3676034?agg=rss</guid></item><item><title>Roughness optimization of electron-beam exposed hydrogen silsesquioxane for immobilization of DNA origami</title><link>http://link.aip.org/link/doi/10.1116/1.3676054?agg=rss</link><description>&lt;span class='authors'&gt;Faisal A. Shah, Kyoung Nan Kim, and Marya Lieberman et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 A novel way to immobilize deoxyribonucleic acid (DNA) origami on a conventional substrate using hydrogen silsesquioxane (HSQ) as a functionalized platform is demonstrated. An alternative approach to quantifying roughness of the HSQ surfaces for 2D DNA origami immobilization is also introduced. Eff ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011806 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Jan 12, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 12 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3676054?agg=rss</guid></item><item><title>Barrier height determination of Au/Oxidized GaAs/n-GaAs using ballistic electron emission spectroscopy</title><link>http://link.aip.org/link/doi/10.1116/1.3675606?agg=rss</link><description>&lt;span class='authors'&gt;Hailang Qin, Zhiqiang Liu, and Cedric Troadec et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Ballistic electron emission spectroscopy (BEES) was used to determine the electron barrier height at the interface of Au and an oxidized GaAs film. Two thresholds were observed in the spectra. In a two-step procedure, we identified the first threshold at ∼1.4 eV, which we show arose from electron- ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011805 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Jan 10, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 10 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3675606?agg=rss</guid></item><item><title>Self-aligned patterning on a flexible substrate using a dual-tone, thermally activated photoresist</title><link>http://link.aip.org/link/doi/10.1116/1.3669380?agg=rss</link><description>&lt;span class='authors'&gt;Wei-Lun K. Jen, Brandon M. Rawlings, and Jeffrey R. Strahan et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The fabrication of electronic devices on flexible substrates represents an opportunity for the development of flexible display technologies, large area devices, and roll-to-roll manufacturing processes. Traditional photolithography encounters alignment and overlay limitations when applied to flexi ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011603 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Jan 10, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 10 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3669380?agg=rss</guid></item><item><title>Analysis of defect-free GaSb/GaAs(001) quantum dots grown on the Sb-terminated (2 × 8) surface</title><link>http://link.aip.org/link/doi/10.1116/1.3675455?agg=rss</link><description>&lt;span class='authors'&gt;Andrew J. Martin, Timothy W. Saucer, and Kai Sun et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Multilayer and single layer GaSb/GaAs(001) quantum dot structures were grown on an Sb-terminated (2 × 8) surface reconstruction and compared to those grown on an As-terminated (2 × 4) surface reconstruction. Uncapped quantum dots grown on the (2 × 8) surface were approximately 25% smaller in diame ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B112 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Mon Jan 09, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Mon, 09 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3675455?agg=rss</guid></item><item><title>Photoluminescence study of self-assembled GaAs quantum wires on (631)A-oriented GaAs substrates</title><link>http://link.aip.org/link/doi/10.1116/1.3673798?agg=rss</link><description>&lt;span class='authors'&gt;E. Cruz-Hernández, D. Vázquez-Cortés, and A. Cisneros-de-la-Rosa et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The authors report a low-temperature photoluminescence (PL) study of multiple GaAs layers grown between AlAs(0.6 nm)/GaAs(0.6 nm) short-period superlattice barriers (SLBs) simultaneously grown on both GaAs(631)A and (100) substrates. Five GaAs-layers of different nominal thicknesses (LW, ranging f ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B111 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Mon Jan 09, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Mon, 09 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3673798?agg=rss</guid></item><item><title>Effect of ballast-resistor and field-screening on electron-emission from nanodiamond emitters fabricated on micropatterned silicon pillar arrays</title><link>http://link.aip.org/link/doi/10.1116/1.3674284?agg=rss</link><description>&lt;span class='authors'&gt;N. Ghosh, W. P. Kang, and J. L. Davidson et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 This paper describes the influence of ballast-resistor and field-screening on the electron field-emission behavior of nanodiamond emitter arrays fabricated on micropatterned silicon pillars. Arrays of 50 × 50 silicon pillars capped with nanodiamond with different ballast resistances and pillar sep ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 012201 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Fri Jan 06, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Fri, 06 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3674284?agg=rss</guid></item><item><title>Deep anisotropic LiNbO3 etching with SF6/Ar inductively coupled plasmas</title><link>http://link.aip.org/link/doi/10.1116/1.3674282?agg=rss</link><description>&lt;span class='authors'&gt;Deng Jun, Jia Wei, and Ching Eng Png et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 A SF6/Ar inductively coupled plasma (ICP) technique was investigated to improve etching of proton exchanged LiNbO3. The influences of He backside cooling, power, and gas flows on characteristics such as etching rate, sidewall slope angle, and surface roughness were investigated. Total gas flow is  ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011208 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Fri Jan 06, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Fri, 06 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3674282?agg=rss</guid></item><item><title>Strategy for focused ion beam compound material removal for circuit editing</title><link>http://link.aip.org/link/doi/10.1116/1.3674280?agg=rss</link><description>&lt;span class='authors'&gt;Yariv Drezner, Yuval Greenzweig, and Amir Raveh&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Both selective and nonselective focused ion beam (FIB) processes have become critical for enabling fine-scale activities such as nano-machining and nano-fabrication in compound material removal applications. In this paper, we investigate the influence of FIB ion acceleration voltage on gas assiste ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011207 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Fri Jan 06, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Fri, 06 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3674280?agg=rss</guid></item><item><title>Fabrication of stable and reproducible submicron tunnel junctions</title><link>http://link.aip.org/link/doi/10.1116/1.3673790?agg=rss</link><description>&lt;span class='authors'&gt;I. M. Pop, T. Fournier, and T. Crozes et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The authors have performed a detailed study of the time stability and reproducibility of submicron Al/AlOx/Al tunnel junctions, fabricated using standard double angle shadow evaporations. The authors have found that by aggressively cleaning the substrate before the evaporations; thus preventing an ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 010607 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Fri Jan 06, 2012&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Fri, 06 Jan 2012 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3673790?agg=rss</guid></item><item><title>Rare-earth-metal oxide buffer for epitaxial growth of single crystal GeSi and Ge on Si(111)</title><link>http://link.aip.org/link/doi/10.1116/1.3673799?agg=rss</link><description>&lt;span class='authors'&gt;Rytis Dargis, Erdem Arkun, and Andrew Clark et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Ternary and binary rare-earth oxides that are used as a template buffer, which accommodates the crystal lattice mismatch between substrate and a semiconductor layer, are discussed here. The oxides were grown on Si(111) substrates and exhibit the cubic bixbyite crystal structure. Stabilization of t ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B110 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Wed Dec 28, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Wed, 28 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3673799?agg=rss</guid></item><item><title>Molecular beam epitaxy control and photoluminescence properties of InAsBi</title><link>http://link.aip.org/link/doi/10.1116/1.3672023?agg=rss</link><description>&lt;span class='authors'&gt;S. P. Svensson, H. Hier, and W. L. Sarney et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Thick InAsBi layers were grown for photoluminescence (PL) characterization. The As to In overpressure ratio was carefully characterized and adjusted to achieve Bi-droplet-free surfaces. A closed loop feedback system was used to maintain the As overpressure during a 5-h deposition sequence. Despite ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B109 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Dec 27, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 27 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672023?agg=rss</guid></item><item><title>Interface properties of (In,Ga)As/GaAs quantum wells grown by solid-phase epitaxy</title><link>http://link.aip.org/link/doi/10.1116/1.3672022?agg=rss</link><description>&lt;span class='authors'&gt;E. Luna, R. Hey, and A. Trampert&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 (In,Ga)As/GaAs quantum wells (QWs) are successfully fabricated via a thermally induced structural transition from deposited amorphous material to epitaxial films, also known as solid-phase epitaxy (SPE). Although exact processes occurring during the epilayer formation are unknown, it is shown that ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 02B108 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Tue Dec 27, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Tue, 27 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672022?agg=rss</guid></item><item><title>Directed assembly in epitaxial zinc oxide films on focused ion beam modified sapphire substrates</title><link>http://link.aip.org/link/doi/10.1116/1.3672006?agg=rss</link><description>&lt;span class='authors'&gt;Benjamin D. Myers, Blake L. Stevens, and Dorota I. Rożkiewicz et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 A new method for directed self-assembly using focused ion beam (FIB) and physical vapor deposition is presented. The high resolution and site-specific patterning capabilities of FIB are coupled with the self-assembly process in heteroepitaxial thin film growth. An efficient FIB-induced damage mech ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 010605 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Dec 22, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 22 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672006?agg=rss</guid></item><item><title>Carbon monoxide detection sensitivity of ZnO nanorod-gated AlGaN/GaN high electron mobility transistors in different temperature environments</title><link>http://link.aip.org/link/doi/10.1116/1.3672010?agg=rss</link><description>&lt;span class='authors'&gt;Chien-Fong Lo, Lu Liu, and Byung-Hwan Chu et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The effect of ambient temperature on the detection sensitivity of carbon monoxide (CO) using ZnO nanorod-gated AlGaN/GaN high electron mobility transistor (HEMT) sensors was studied over a range of temperatures from 25 to 400 °C. An increase of the HEMT drain current was observed for exposure to t ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 010606 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Dec 22, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 22 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672010?agg=rss</guid></item><item><title>Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics</title><link>http://link.aip.org/link/doi/10.1116/1.3671008?agg=rss</link><description>&lt;span class='authors'&gt;Hualiang Shi, Huai Huang, and Junjing Bao et al.&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 The damage induced by CO2 and O2 plasmas to an ultra low-k (ULK) dielectric film with a dielectric constant (κ) of 2.2 was investigated. The dielectric constant was observed to increase due to methyl depletion, moisture uptake, and surface densification. A gap structure was used to delineate the r ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 011206 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Thu Dec 22, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Thu, 22 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3671008?agg=rss</guid></item><item><title>Determination of crystal orientation of silicon via shape-controlled vapor-solid growth of copper nanoparticles</title><link>http://link.aip.org/link/doi/10.1116/1.3672007?agg=rss</link><description>&lt;span class='authors'&gt;Jin-Woo Han and M. Meyyappan&lt;/span&gt; &lt;br/&gt; &lt;span class='abstract'&gt;
 Crystal lattice orientations of substrates are inspected via morphology of copper particles generated by a vapor-solid growth process. The high thermal energy enables diffusion of copper ions into the crystal substrate, and then the copper ions on the substrate are preferentially gathered, forming ...&lt;/span&gt; &lt;span class='citline'&gt;[J. Vac. Sci. Technol. B &lt;strong&gt;30&lt;/strong&gt;, 010604 (2012)]&lt;/span&gt; &lt;span class='pubdate'&gt;published Wed Dec 21, 2011&lt;/span&gt;.</description><category>Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures</category><pubDate>Wed, 21 Dec 2011 00:00:00 EST</pubDate><guid>http://link.aip.org/link/doi/10.1116/1.3672007?agg=rss</guid></item></channel></rss>
